Deposition techniques

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We are able to deposit various thin films by RF magnetron sputtering or vacuum thermal evaporation. Sputter deposition involves ejecting material from a "target" onto a "substrate", while during evaporation the source material is evaporated in a vacuum directely to the target.

Thin films technology

Why thin films?

A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. The controlled synthesis of materials as thin films is a fundamental step in many applications, ranging from optical coatings and solar cells to drug delivery.

Analysis & interpretation

SEM, AFM, XPS, XRD, profilometry, optical parameters, quantum efficiency, etc.

To test our deposited layers we use a wide range of characterization methods, including structural, morphological, optical or quantum efficiency analysis.

In brief

GAP is a research group within the National Institute for Laser, Plasma & Radiation Physics (INFLPR), Laser Department. It is, mostly, involved in thin film deposition and characterization for various applications, such as solar cells components and novel metamaterials or graphene based devices.

To achieve these goals, the group uses its own equipment (described on the research page) but also the devices present in the dynamic Laser Department of the INFLPR.

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