Advanced Technologies in Thin Films (TAF) is a research group within the National Institute for Laser, Plasma & Radiation Physics (INFLPR), Laser Department. It is mainly preoccupied with thin film deposition by various techniques and characterization for specific applications; such as solar cells components and novel metamaterials or graphene based devices.
Advanced Technologies in Thin Films
Deposition techniques
High quality and state of the art services.We are able to deposit various thin films by RF magnetron sputtering or vacuum thermal evaporation. Sputter deposition involves ejecting material from a "target" onto a "substrate", while during evaporation the source material is evaporated in a vacuum directely to the target.
Thin films technology
Why thin films?A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. The controlled synthesis of materials as thin films is a fundamental step in many applications, ranging from optical coatings and solar cells to drug delivery.
Analysis & interpretation
SEM, AFM, XPS, XRD, profilometry, optical parameters, quantum efficiency, etc.To test our deposited layers we use a wide range of characterization methods, including structural, morphological, optical or quantum efficiency analysis.